29 March 2019
The Price list(PDF) is revised on 1st April 2019.
The list of responsible person for equipments are now available.Responsible person list(PDF)
Additionary、Please get a new reserch submittion number.
31 March 2017
The Price list(PDF) is revised on 1st April 2017.
24 March 2017
The number of Aobayama Shuttle Bus service(free of charge) is increased from April 2017. Directions to Nishizawa center from April 2017 is now available.
17 November 2015
Directions to Nishizawa center change on 6th December 2015 with the open of New subway line "Tozaisen" and reorganization of bus timetables.
18 June 2015
Masaaki Moriyama, a research associate, received the 2014 best research support award. See this page.
4 and 6 inch facilities for microelectromechanical systems(MEMS)
The “Hands-on access fab.” is an open access facility that companies can easily access and utilize for their prototyping or small volume production. The facility is shared with other users. The users can make investment small, because they are able to achieve prototyping of a device at appropriate cost. As a result, the users can reduce the risk in development, and can bridge R&D stage to manufacture stage more smoothly.
Pattern generator（For emulsion / Cr mask making）, developer, oxidation/diffusion furnace, LP-CVD（poly-Si,SiO2,SiN）, PE－CVD（SiO2,SiN）, sputtering, evaporation, Si-DeepRIE, bonder, dicer and etc.（cleaning, photolithography, wet etching, measurement and etc.） See this page.
Companies can access accumulated know-how at Tohoku University. Skilled engineer staffs coach the user.
Companies pay fee depending on usage.
Facility (CR, office, etc.) usage fee : ¥570 /h
Technical assistant fee : ¥5,565 /h
Equipment usage fee : max. ¥12,397 /h