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\u7533\u8fbc\u307f\u30d5\u30a9\u30fc\u30e0\uff1a\u3000https:\/\/forms.gle\/CF4vT8qURMc5jCL7A<\/a>
\u554f\u3044\u5408\u308f\u305b\u5148: \u6771\u5317\u5927\u5b66\u30de\u30a4\u30af\u30ed\u30b7\u30b9\u30c6\u30e0\u878d\u5408\u7814\u7a76\u958b\u767a\u30bb\u30f3\u30bf\u30fc\u3000\u65e9\u5ddd\u660c\u5b50
E-mail: masako.hayakawa.b1\u3000\u2190\u3000@tohoku.ac.jp\u3092\u3064\u306a\u3052\u3066\u304f\u3060\u3055\u3044\u3002
Tel. 022-229-4113<\/p>\n\n\n\n
13:30 Registration
13:45 Welcome and introduction to Tohoku University
\uff08Kentaro Totsu, \u03bcSIC, Tohoku University\uff09
14:00 Latest upgrades of the MLA 150 and DWL 66+ Laser Lithography Systems
\uff08Sven Preuss , Product Manager DWL-Series, Heidelberg Instruments Mikrotechnik\uff09
14:40 Overview of MLA 150 utilization at Tohoku University and evaluation of photoresist: a case study on SU-8 3005
\uff08Yoko Furubayashi, \u03bcSIC, Tohoku University\uff09
15:00 GenISys BEAMER application for laser direct writing
\uff08Satoshi Shimizu, GenISys K.K.\uff09
15:30 Coffee break
15:50 Reticle fabrication on DWL 2000 with BEAMER correction
\uff08Masaaki Moriyama, \u03bcSIC, Tohoku University\uff09
16:20 NanoFrazor, modular nanolithography system
\uff08Simon Bonanni, Exploring nanofabrication with the NanoFrazor, Heidelberg Instruments Nano\uff09
16:40 Introduction of Hands-on-access Fab, \u03bcSIC
\uff08Kentaro Totsu, \u03bcSIC, Tohoku University\uff09
17:00 Wrap up
17:10 End<\/p>\n","protected":false},"excerpt":{"rendered":"